Universal, fully automatic wet dispersion for fine to coarse particles
QUIXEL and QUIXEL/S are high-performance wet dispersion systems for the particle analysis of suspensions and emulsions. Combined with the HELOS laser diffraction system, QUIXEL enables particle size analysis from 0.1 µm to 3,500 µm. QUIXEL/S, combined with the QICPIC dynamic image analysis system, extends the analysis to include particle shape over a size range of 0.5 µm to 3,500 µm.
The design enables very short measurement cycles. Even high-density particles are reliably kept in suspension and transported through the flow cuvette. An integrated ultrasonication unit supports the wet dispersion process in both systems with adjustable power from 0 to 60 W.
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Fully automatic operation and intuitive control
Operation is fully automated. All parameters, including pump speed and ultrasonic power, are controlled via the software. Integrated liquid level sensors monitor the fill level and support the automated filling and draining processes.
For flexible operation, all functions can also be controlled manually via the front control panel. These include filling, degassing, ultrasonication, circulation, draining, pump speed, temperature control of the suspension liquid, additive dosing, and insertion and release of the flow cuvette.
QUIXEL/S also displays the current optical concentration on the control panel. This facilitates controlled sample dosing until the desired optical concentration is reached and supports reproducible measurement conditions.
Flow cuvettes and chemical resistance
Stainless steel flow cuvettes with optical path lengths of 2 mm or 6 mm are available for both systems. The cuvettes can be easily removed for cleaning. Different seal materials allow chemical compatibility to be matched to the sample and the dispersion liquid: FKM, EPDM or FFKM are available for QUIXEL, while QUIXEL/S offers FKM or FFKM.
Flexible equipment options
Special top lids with automatic additive dosing and an internal heater are available as options for both systems. QUIXEL for HELOS also offers external heating or cooling options. An interface supports the integration of external sampling and sample preparation systems.
Fast draining and easy cleaning
Easy access allows the flow cuvettes and basin to be cleaned manually. The lowerable basin bottom enables rapid draining and cleaning within seconds, even when using high-viscosity dispersion media.
