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ÃøÁ¤±â: HELOS BF: 0.1 ~ 875 micron
KF: 0.1 ~8750 micron
VARIO: 0.1 ~ 8750 micron
ÀÌ·Ð: ±¤È¸Àý l = 632,8 nm1
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31 ¿ø¼Ò ¹Ý¿øÇü °ËÃâ±â
ÃÊ´ç 2000ȸ, ¿¬¼Ó ÀÚµ¿Á¤·ÄÀåÄ¡
Æò°¡: Fraunhofer MIE (¼±ÅûçÇ×)
¹üÀ§: optical modules R1 ~ R8
¼º´É: ¹Ýº¹¼º

ÀçÇö¼º 
x10, x50, x90
s < 0.04% ÀÏ¹Ý (¿¬¼Ó½Ã·á)
s < 0.3% ÀÏ¹Ý (ÃàºÐ½Ã·á)
s < 1% mean ºñ±³Ç¥ÁØÆíÂ÷
/Dx/ < 2.5% ÃÖ°í ºñ±³Ç¥ÁØÆíÂ÷
< 5% Submicron¿µ¿ª¿¡¼­ÀÇ ºñ±³ÆíÂ÷
Á¦¾î: WINDOX ¼ÒÇÁÆ®¿þ¾î Á¦¾î WINDOWS XP Pro / 2000
ÀÀ¿ë: ·¹ÀÌÁ®Ãâ·Â

º¸¾Èµî±Þ ¹× Á¾·ù
±¤¿øÅ©±âr
(1/e©÷)

5 mW
3A/IP40
R1 ¹× R2 : 2.2 mm
R3 ~ R5: 13 mm
R6 ¹× R7: 26 mm
R8: 35mm
ǰÁúº¸Áõ: º¸Áõ¼­
Ç¥Áؽ÷á




°ËÁõ
standard test procedure
SiC - F1200 (x50 = 4.5 micron)
SiC - P600 ( x50 = 27micron)
SiO2 - F34 (x50 = 220micron)
SiC -P 50 (x50 = 420micron)
FDA ½ÂÀÎ

Ãß°¡Á¤º¸ ...

Áñ°Üã±â¿¡ Ãß°¡. ´Ù¸¥»ç¶÷¿¡°Ô ¾Ë¸®±â. ÀÌÆäÀÌÁö¸¦ Ãâ·ÂÇϱâ.

HELOS
±¤È¸Àý ÀÔµµºÐ¼®ÀåÄ¡
0.1 ~ 8750 micron

symbol: laser diffraction

·¹ÀÌÁ® ¾ÈÀü±âÁØ

HELOS/BF with dry / wet disperser combination OASIS

¸ðµç HELOS/BF ¹× HELOS/KFÁ¦Ç°Àº
Àϱ޷¹ÀÌÁ®Á¦Ç°ÀÓ.
Á÷Á¢ ÃÄ´Ùº¸Áö ¸¶½Ê½Ã¿ä.

HELOS/KF-VARIO with flexible width of the measuring zone, e.g. for spray apllication

¸ðµç HELOS /KF-VarioÁ¦Ç°Àº
Àϱ޷¹ÀÌÁ®Á¦Ç°ÀÓ.
Á÷Á¢ ÃÄ´Ùº¸Áö ¸¶½Ê½Ã¿ä.